X-SRAMTM

5× Higher AI
On-Chip Memory

X-SRAMTM

5x Higher AI On-Chip Memory
X-SRAM Type B Cell

X-SRAM is a next-generation AI on-chip memory technology that replaces conventional 6T SRAM with a novel 2-transistor architecture, delivering up to 5× higher memory density to enable 1–2 GB of on-chip memory to break the AI memory wall.

Key Highlights

  • Up to 5× Higher Memory Density

  • Enable 1-2 GB On-Chip Memory

  • Innovative 2T Cell Structure

  • Nanosheet CMOS Compatible

  • A Roadmap to Future 3D SRAM

The AI Memory Challenge

AI systems rely on two key memories: HBM for storing large AI models and SRAM for high-speed on-chip computation. Conventional SRAM uses a six-transistor (6T) cell to store each bit, resulting in a relatively large cell size. SRAM scaling has largely plateaued at approximately 0.021 μm² since the 5 nm generation, creating the AI memory wall. As a result, today’s AI processors typically integrate only 200–400 MB of on-chip SRAM, limiting AI performance.

Delivers 5x Higher Density

X-SRAM replaces conventional 6T SRAM with a novel 2-transistor architecture, delivering up to 5× higher density with SRAM-class performance. Fully compatible with standard nanosheet CMOS processes, X-SRAM enables seamless integration into today's 2–3 nm logic nodes and future technology generations.


X-SRAM Cell Family

The X-SRAM cell family features multiple architectures optimized for different applications and foundry processes.

Type A
Dual-gate

Blanced size and process compatibility

Type B
Two-transistor

Full compatible to standard nanosheet process

Type C
One-transistor

Minimum cell with minor process modification

Type D
Multi-gate

Adjustable operating voltage for wide range of application

X-SRAM Cell Family

The X-SRAM cell family features multiple architectures optimized for different applications and foundry processes.

Type A
Dual-gate

Blanced size and process compatibility

Type B
Two-transistor

Full compatible to standard nanosheet process

Type C
One-transistor

Minimum cell with minor process modification

Type D
Multi-gate

Adjustable operating voltage for wide range of application

Roadmap to 3D SRAM

2D X-SRAM
3D X-SRAM

X-SRAM's simplified cell architecture and minimal interconnect provide a scalable foundation for future 3D SRAM. By overcoming the scaling limits of conventional SRAM, X-SRAM delivers up to 5× higher 2D density today and enables 20–40× greater on-chip memory capacity through future 3D stacking.